Strain gauge, and system for spatially locating such gauges
US9200889B2 · kind B2 · utility
16Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2010 |
| Grant date | Dec 1, 2015 |
| Priority date | — |
| Expiry date | Oct 19, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/46
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A strain gauge includes a substrate (2) for mounting an element (3) to be reversibly lengthened by a force applied while displaying a variation in the resistance thereof, the element (3) lengthening itself along an axis for measurement by the gauge. The gauge includes at least one contrast target (5, 6) capable of reflecting an incident light beam, the at least one contrast target (5, 6) being placed on the gauge in a predetermined position that makes it possible to predetermine the center of the axis (4), for measurement by the strain gauge (1), by detecting the position of the at least one contrast target (5, 6).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.