Arrangement and method for cooling a plasma-based radiation source

US9202659B2 · kind B2 · utility

Assignee

• Ushio Denki Kabushiki Kaisha · JP

Inventors

• Gota Niimi · Tokyo, JP
• Dominik Marcel Vaudrevange · Aachen, DE
• Ralf Conrads · Aachen, DE
• Maghiel Jan Kole · San Jose, US
• Wilhelmus V. J. Van Nunspeet · Simpelveld, NL
• Johannes Wilhelmus Jacobus Leonardus Cuijpers · Roermond, NL
• Andre Prinz

Key dates

• Filing date: Oct 20, 2014
• Grant date: Dec 1, 2015
• Expiry date: Oct 20, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/002
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

An arrangements and methods for cooling a plasma-based radiation source having a revolving element which is to be cooled, particularly for application in EUV radiation sources, is disclosed. The revolving element is immersed in the metal coolant in a first vessel of a primary cooling circuit, and a secondary cooling circuit with a cooling liquid evaporating at the desired operating temperature of the metal coolant has a control unit for controlling at least one atomizing arrangement in a differentiated manner and for selectively controlling a heater in case the determined temperature falls below a minimum operating temperature of the metal coolant. The at least one atomizing arrangement in a cooling section selectively sprays individual wall regions of the first vessel with the cooling liquid depending on the determined temperature of the metal coolant.