Vapor chamber structure
US9204574B1 · kind B1 · utility
1Cited by
6References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2013 |
| Grant date | Dec 1, 2015 |
| Priority date | — |
| Expiry date | Dec 28, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vapor chamber structure which locks the upper planar plate lid to the lower planar plate base without the need for brazing and prevents distortion of the surfaces from internal pressure in the chamber. The basic structure has parallel rows of latching structures on the interior surfaces of the upper planar plate lid and the lower planar plate base. Each row of latching structures has a cross section in the shape the letter “L” with the top of the “L” attached to the interior surface of the lid so that the horizontal sections of the “L”s face the lower planar base plate when the chamber is assembled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.