Metal mask manufacturing method and metal mask
US9205443B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 5, 2014 |
| Grant date | Dec 8, 2015 |
| Priority date | — |
| Expiry date | Dec 5, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/80
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metal mask manufacturing method includes: (a) disposing a first anti-etching layer having a first void region on a first face of a substrate; (b) disposing a second anti-etching layer on a second face of the substrate opposite to the first face, wherein a second void region of the second anti-etching layer is corresponding to the first void region; (c) performing a first etching on the first face and the second face to form a first concave part and a second concave part separated by a part of the substrate; (d) disposing a protecting layer filled into the first concave part; (e) performing a second etching from the second face to produce a void between the first concave part and the second concave part; (f) removing the second anti-etching layer; and (g) performing a third etching from the second face.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.