Patent · US Active

Self-replicating materials

US9206471B2 · kind B2 · utility

0Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 11, 2009
Grant dateDec 8, 2015
Priority date
Expiry dateDec 30, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC12N15/1068
  • WIPO fieldBiotechnology
  • WIPO sectorChemistry

Abstract

The invention provides micron and sub-micron scale particles designed to recognize and selectively interact with each other by exploiting the recognition and specificity enabled by DNA-sequence-encoded coatings. Such materials possess sufficient information coded in their chemical and physical interactions to self assemble and self replicate. The invention further provides methods of using such materials to create self replicating and organizing materials. Replicated copies are permanently linked and then thermally detached, freeing them to act as templates for further growth. This new class of condensed matter systems, provides means to design and control the structure and function of materials and machines from the microscopic to life-size. In another aspect of the invention, depletion type forces and depletion zones can be utilized in the implementation of the self assembly and self replication of materials, including without limitation colloidal particles. The invention further provides novel means of synthesis and materials built by such synthesis, which may be used in a variety of applications, including microelectronics.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.