Constructing resistivity models from stochastic inversion
US9207351B2 · kind B2 · utility
3Cited by
18References
35Claims
0Family size
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Key dates
| Filing date | Mar 26, 2010 |
| Grant date | Dec 8, 2015 |
| Priority date | — |
| Expiry date | Jan 17, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V99/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Embodiments described herein use stochastic inversion (460) in lower dimensions to form an initial model (458) that is to be used in higher-dimensional gradient-based inversion (466). For example, an initial model may be formed from 1.5-D stochastic inversions, which is then processed (464) to form a 3-D model. Stochastic inversions reduce or avoid local minima and may provide an initial result that is near the global minimum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.