Photopolymerizable compositions for electroless plating methods
US9207533B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2014 |
| Grant date | Dec 8, 2015 |
| Priority date | — |
| Expiry date | May 22, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/028
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photopolymerizable composition has seven essential components: (a) a photopolymerizable epoxy material, (b) a photoacid generator such as an onium salt, (c) electron acceptor photosensitizer, (d) an electron donor co-initiator having an oxidation potential of 0.1 V to 3 V vs. SCE, (e) metal particles, and in some embodiments, (f) one or more free radically polymerizable compounds, and (g) one or more free radical photoinitiators. This photopolymerizable composition can be applied or printed onto one or both sides of various substrates to form articles that can be used to form electrically conductive materials. Methods for using the photopolymerizable compositions include electroless plating methods that can be carried out in roll-to-roll printing and plating systems once various photocured patterns are formed from the photopolymerizable compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.