Power regulated implant
US9211207B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2010 |
| Grant date | Dec 15, 2015 |
| Priority date | — |
| Expiry date | Jan 12, 2034 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04B2201/0801
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An implantable pumping system for pumping a fluid in an implantable gastric banding system comprises a pump for pumping the fluid. A voltage source provides a pump voltage to the system, and a voltage control circuit increases or decreases the pump voltage. A pump driver applies the pump voltage to the pump at a phase and a frequency. The implantable pumping system comprises a sensor that monitors a parameter to facilitate adjusting at least one of the phase or the frequency to maintain a desired value of the parameter. The parameter is associated with at least one of the implantable pumping system or the implantable gastric banding system. A micro controller is configured to manipulate at least one of the phase or the frequency to maintain the desired value of the parameter. The sensor may comprise a temperature sensor, a pressure sensor, and/or a flow rate sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.