Method of preparing opto-electronic device
US9211566B2 · kind B2 · utility
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3References
25Claims
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Key dates
| Filing date | Dec 27, 2012 |
| Grant date | Dec 15, 2015 |
| Priority date | — |
| Expiry date | Feb 26, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is provided to produce an opto-electronic device comprising a substrate, a first electrode layer, a second electrode layer of opposite polarity to said first electrode layer, any interlayers and, between said first and second electrode layers, a first functional material in interfacial contact with a second functional material, wherein the first functional material has the structure of a laterally porous film and the second functional material is a film disposed over and interpenetrating with the film of the first functional material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.