Patent · US Active

Photocatalytic material

US9212090B2 · kind B2 · utility

0Cited by

1References

17Claims

0Family size

Assignee

SAINT-GOBAIN GLASS FRANCE · FR

Inventors

Stephane Laurent · Clermont-Ferrand, FR
Anne Durandeau · Paris, FR
Emmanuel Valentin · Le Plessis-Trévise, FR

Key dates

Filing date	Jul 13, 2010
Grant date	Dec 15, 2015
Priority date	—
Expiry date	Apr 12, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24942
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

One subject of the invention is a material comprising a substrate coated on at least one portion of at least one of its faces with a stack comprising a photocatalytic layer, the geometrical thickness of which is between 2 and 30 nm, and at least one pair of respectively high and low refractive index layers positioned underneath said photocatalytic layer so that in the or each pair, the or each high refractive index layer is closest to the substrate, said material being such that the optical thickness, for a wavelength of 350 nm, of the or each high refractive index layer, except the photocatalytic layer, is between 170 and 300 nm and the optical thickness, for a wavelength of 350 nm, of the or each low refractive index layer is between 30 and 90 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.