Nanostructures with strain-induced resistance

US9212960B2 · kind B2 · utility

Assignee

• The Board of Trustees of the Leland Stanford Junior University · US

Inventors

• Darren J. Lipomi · San Diego, US
• Michael Vosgueritchian · Cupertino, US
• Chee Keong Tee · Singapore, SG
• Sondra Hellstrom · East Palo Alto, US
• Zhenan Bao · Lyndhurst, US

Key dates

• Filing date: Oct 22, 2013
• Grant date: Dec 15, 2015
• Expiry date: Jan 13, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K85/221
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Apparatuses and methods, consistent with embodiments herein, are directed to an apparatus having a stretchable substrate and a plurality of nanostructures. While the plurality of nanostructures are adhered to the stretchable substrate, the stretchable substrate and the nanostructures are stretched and/or operate in a stretched mode in which the nanostructures are characterized by a resistance corresponding to a strain imparted due to the stretching. When the substrate is relaxed or the stretching otherwise lessened, the nanostructures continue to be characterized as a function of the strain and the corresponding resistance, with buckled segments of the nanostructures being adhered along a surface of the substrate.