Patent · US Active

Apparatus for treating substrate by applying chemical solution on substrate using plural rollers

US9214366B2 · kind B2 · utility

3Cited by
2References
19Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 20, 2012
Grant dateDec 15, 2015
Priority date
Expiry dateJul 10, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67706
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus for treating a substrate including a plurality of transfer rollers configured to transfer a substrate and simultaneously to be rotated to wet a back surface of the substrate; a plurality of chemical solution supply tanks configured to receive the chemical solution therein, the plurality of the chemical solution supply tanks arranged under the plurality of the transfer rollers, respectively, with being spaced apart a predetermined distance from each other; a main tank configured to surround the plurality of the chemical solution supply tanks; and an exhaustion unit configured to suck and exhaust fume generated in the process of wetting the back surface with the chemical solution and liquid drops of the chemical solution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.