Removal of toxic chemicals using metal-organic frameworks (MOFs) post-treated via plasma-enhanced chemical vapor deposition (PECVD) with fluorocarbons

US9216404B1 · kind B1 · utility

Assignee

• The United States of America as represented by the Secretary of the Army · US

Inventors

• Gregory W. Peterson · Bel Air, US
• Jared B. DeCoste · Bel Air, US
• Martin Wilkins Smith · Fort Lauderdale, US
• Corinne A Stone · Salisbury, GB
• Colin R. Willis · Salisbury, GB

Key dates

• Filing date: Oct 30, 2014
• Grant date: Dec 22, 2015
• Expiry date: Oct 30, 2034

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01D2253/204
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A system and method of filtering comprising adsorbing a toxic chemical using a metal-organic framework (MOF) compound that has been post-treated with fluorocarbons using plasma-enhanced chemical vapor deposition (PECVD). The toxic chemical may comprise any of ammonia and cyanogen chloride. Furthermore, the toxic chemical may comprise any of an acidic/acid-forming gas, basic/base-forming gas, oxidizer, reducer, and organic gas/vapor. The toxic chemical is physically adsorbed by the MOF compound. Moreover, the toxic chemical interacts with unsaturated metal sites within the MOF. Additionally, the MOF compound may comprise any of Cu-BTC, MOF-177, and an isoreticular metal-organic frame work (IRMOF) compound. The MOF compound may comprise a metal-carboxylate bond. Additionally, the MOF compound may be unstable in the presence of moisture.