Generating ultrashort laser pulses based on two-stage pulse processing
US9219344B2 · kind B2 · utility
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4References
3Claims
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Key dates
| Filing date | Jan 7, 2013 |
| Grant date | Dec 22, 2015 |
| Priority date | — |
| Expiry date | Feb 24, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2316
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Techniques and devices for producing short laser pulses, including generating ultrashort laser pulses by separating a nonlinear processing of laser pulses via nonlinear self-phase modulation (SPM) in a nonlinear optical medium from a subsequent linear processing of the laser pulses to achieve ultrashort laser pulses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.