Sulfonium salt, chemically amplified resist composition, and pattern forming process
US9221742B2 · kind B2 · utility
6Cited by
38References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 9, 2014 |
| Grant date | Dec 29, 2015 |
| Priority date | — |
| Expiry date | Sep 9, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/54
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A caboxylic acid sulfonium salt having formula (1) is provided wherein R0 is hydrogen or a monovalent hydrocarbon group, R01 and R02 are hydrogen or a monovalent hydrocarbon group, at least one of R0, R01 and R02 has a cyclic structure, L is a single bond or forms an ester, sulfonate, carbonate or carbamate bond with the vicinal oxygen atom, R2, R3 and R4 are monovalent hydrocarbon groups. The sulfonium salt functions as a quencher in a resist composition, enabling to form a pattern of good profile with minimal LWR, rectangularity, and high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.