Patent · US Active

Directional solidification furnace for reducing melt contamination and reducing wafer contamination

US9222196B2 · kind B2 · utility

0Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 19, 2012
Grant dateDec 29, 2015
Priority date
Expiry dateSep 21, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1092
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A directional solidification furnace includes a crucible for holding molten silicon and a lid covering the crucible and forming an enclosure over the molten silicon. The crucible also includes an inlet in the lid for introducing inert gas above the molten silicon to inhibit contamination of the molten silicon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.