Patterned retarder
US9223066B2 · kind B2 · utility
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1References
12Claims
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Assignee
Inventors
Key dates
| Filing date | Aug 29, 2014 |
| Grant date | Dec 29, 2015 |
| Priority date | — |
| Expiry date | Aug 29, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B30/25
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A patterned retarder is provided. A microstructure layer is disposed on a substrate of the optical retarder. The microstructure layer has a plurality of trapezoid protrusions. A bottom angel of the trapezoid protrusions is 12-85 degree. A conformal alignment layer and a liquid crystal phase retarder layer are sequentially disposed on the microstructure layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.