Acid generator, chemically amplified resist composition, and patterning process
US9223205B2 · kind B2 · utility
1Cited by
3References
17Claims
0Family size
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Key dates
| Filing date | Feb 19, 2013 |
| Grant date | Dec 29, 2015 |
| Priority date | — |
| Expiry date | Feb 19, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed an acid generator generating a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat:As a result, there is provided a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of exposure margin and MEF particularly without degradation of resolution and can be effectively and widely used, a chemically amplified resist composition using the same, and a patterning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.