Patent · US Active

Photoresist stripping and cleaning composition, method of its preparation and its use

US9223221B2 · kind B2 · utility

0Cited by

6References

17Claims

0Family size

Assignee

BASF SE

Inventors

Simon Braun · Mannheim, DE
Christian Bittner · Bensheim, DE
Andreas Klipp · Lambsheim, DE

Key dates

Filing date	Mar 18, 2013
Grant date	Dec 29, 2015
Priority date	—
Expiry date	Mar 18, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/22
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.