Patent · US Active

Method for manufacturing a conducting contact on a conducting element

US9224708B2 · kind B2 · utility

0Cited by
1References
15Claims
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Key dates

Filing dateJul 24, 2014
Grant dateDec 29, 2015
Priority date
Expiry dateJul 24, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/15788
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The invention relates to a method for producing an interconnection pad on a conducting element comprising an upper face and a side wall; the method being executed from a substrate at least the upper face of which is insulating; the conducting element going through at least an insulating portion of the substrate, the method being characterized in that it comprises the sequence of the following steps: a step of embossing the conducting element, a step of forming, above the upper insulating face of the substrate, a stack of layers comprising at least one electrically conducting layer and one electrically resistive layer, a step of partially removing the electrically resistive layer, a step of electrolytic growth on the portion of the electrically conducting layer so as to form at least one interconnection pad on said conducting element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.