Patent · US Active

Device for the homogeneous wet-chemical treatment of substrates

US9224894B2 · kind B2 · utility

5Cited by

3References

9Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Juergen Hackenberg · Sachsenheim, DE
Michael Lingner · Düsseldorf, DE
Harald Bauer · Ehningen, DE

Key dates

Filing date	Oct 14, 2014
Grant date	Dec 29, 2015
Priority date	—
Expiry date	Oct 14, 2034

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P70/50
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A device for wet-chemical treatment of substrates includes: an accommodation device for a substrate and a process medium, the substrate having a treatment side in operative connection with the process medium; a fluid guidance element, having a specified surface texture, housed in the accommodation device, the specified surface texture being configured to provide a guidance of the process medium along the specified surface texture, the specified surface texture being positioned lying opposite and at a predetermined fixed recess at a distance from the treatment side of the substrate; and the process medium being moved in the intervening space between the specified surface texture of the fluid guidance element and the treatment side of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.