Plasma source
US9226379B2 · kind B2 · utility
0Cited by
11References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2012 |
| Grant date | Dec 29, 2015 |
| Priority date | — |
| Expiry date | Aug 29, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32064
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.