Patent · US Active

Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases

US9227169B2 · kind B2 · utility

7Cited by

7References

24Claims

0Family size

Assignee

Iplas GmbH · DE

Inventors

Ralf Spitzl · Troisdorf, DE
Arno Behr · Goldkronach, DE
Christian Wolff · Monheim, DE
Thorsten Oberreuther · Dortmund, DE

Key dates

Filing date	Dec 16, 2013
Grant date	Jan 5, 2016
Priority date	—
Expiry date	Dec 16, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P20/52
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A device for carrying out gas reactions, comprising a plasma reactor with a through-flow of gases which has a, particularly cylindrical, plasma chamber, wherein flow-forming elements for forming a flow of gases are arranged before and/or in and/or after the plasma reactor in order to form a gas stream within the plasma chamber such that at least one, particularly central, zone in the gas flow is formed which is flow-reduced. A method for carrying out gas reactions is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.