Method for directed self-assembly (DSA) of a block copolymer (BCP) using a blend of a BCP with functional homopolymers
US9230820B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 8, 2015 |
| Grant date | Jan 5, 2016 |
| Priority date | — |
| Expiry date | May 8, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for directed self-assembly (DSA) of block copolymers (BCPs) uses a BCP blend with a small portion of functional homopolymers, called “inks”, before deposition and annealing of the BCP. A substrate has a patterned sublayer formed on it. The BCP blend is deposited on the patterned sublayer and annealed. The BCP blend is guided by the sublayer pattern. The inks selectively distribute into blocks, and part of the inks graft on the substrate underneath the blocks. The BCP blend layer is rinsed away, leaving the grafted inks. The grafted inks form a chemical contrast pattern that has the same geometry with the BCP bulk morphology. This process is repeated, which results in the grafted inks forming a thicker and denser chemical contrast pattern. This chemical contrast pattern of grafted inks is used for the DSA of a BCP that self-assembles as lamellae perpendicular to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.