Gas refraction compensation for laser-sustained plasma bulbs
US9232622B2 · kind B2 · utility
0Cited by
10References
18Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 3, 2014 |
| Grant date | Jan 5, 2016 |
| Priority date | — |
| Expiry date | Sep 3, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with at least one property that is varied to compensate for optical aberrations in the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.