Patent · US Active

Production process for a micromechanical component and micromechanical component

US9233841B2 · kind B2 · utility

0Cited by
7References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 14, 2013
Grant dateJan 12, 2016
Priority date
Expiry dateDec 5, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2201/0133
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A production process for a micromechanical component includes at least partially structuring at least one structure from at least one monocrystalline silicon layer by at least performing a crystal-orientation-dependent etching step on an upper side of the silicon layer with a given (110) surface orientation of the silicon layer. For the at least partial structuring of the at least one structure, at least one crystal-orientation-independent etching step is additionally performed on the upper side of the silicon layer with the given (110) surface orientation of the silicon layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.