Material forming supramolecular structures, process and uses
US9234067B2 · kind B2 · utility
16Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 22, 2006 |
| Grant date | Jan 12, 2016 |
| Priority date | — |
| Expiry date | Sep 25, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09J2301/304
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A novel material, forming supramolecular structures below its transition temperature, which contains at least one C═O and/or C═S group and at least one N—H, O—H and/or S—H group and wherein the material has the structureA(-X—B)n (1)wherein A, X, B and n are defined. Also a process for preparation of the material and uses thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.