Patent · US Active

Method for applying a first metal onto a second metal, an isolator or semiconductor substrate, and the respective binding units

US9234120B2 · kind B2 · utility

0Cited by

0References

11Claims

0Family size

Assignees

Deutsches Krebsforschungszentrum · DE
Forschungszentrum Jülich GmbH · DE

Inventors

Manfred Wiessler · Bischofswerda, DE
Peter Lorenz · Jefferson, US
Heinz Fleischhacker · Dossenheim, DE
Ranjita Ghosh-Moulick · Quepem, IN
Sandra Gilles · Bonn, DE
Dirk Mayer · Frechen, DE
Andreas Offenhaeusser · Aachen, DE

Key dates

Filing date	Aug 12, 2011
Grant date	Jan 12, 2016
Priority date	—
Expiry date	Aug 12, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC07B2200/11
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

The present invention concerns a method for applying a first metal onto a second metal, an isolator or semiconductor substrate by a Diels-Alder reaction, in particular a Diels-Alder reaction with inverse electron demand. The present invention further concerns the binding units L 1960 and F 160.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.