Variable polarization wafer inspection
US9239295B2 · kind B2 · utility
4Cited by
6References
48Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 5, 2013 |
| Grant date | Jan 19, 2016 |
| Priority date | — |
| Expiry date | Oct 30, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8848
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for variable polarization wafer inspection are provided. One system includes one or more polarizing components position in one or more paths of light scattered from a wafer and detected by one or more channels of an inspection system. The polarizing component(s) are configured to have detection polarization(s) that are selected from two or more polarization settings for the polarizing component(s).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.