Method and apparatus for detecting and processing specific pattern from image
US9239946B2 · kind B2 · utility
0Cited by
5References
9Claims
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Key dates
| Filing date | Jul 11, 2012 |
| Grant date | Jan 19, 2016 |
| Priority date | — |
| Expiry date | Nov 11, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V30/287
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In an image within which a face pattern is detected, when a ratio of a skin color pixel is equal to or smaller than a first threshold value in a first region and a ratio of a skin color pixel is equal to or greater than a second threshold value in a second r region, the vicinity of the first region is determined to be a face candidate position at which the face pattern can exist. Face detection is carried out on the face candidate position. The second region is arranged in a predetermined position relative to the first region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.