Thin-film transistor array substrate, display device including the same, and method of manufacturing the thin-film transistor array substrate
US9245908B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2014 |
| Grant date | Jan 26, 2016 |
| Priority date | — |
| Expiry date | Apr 14, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/481
Abstract
A method of manufacturing a thin film transistor (TFT) array substrate is disclosed. In one aspect, the method includes forming an active layer on a substrate, forming a first insulating layer on the substrate to cover the active layer, and forming a first gate electrode on the first insulating layer in an area corresponding to the active layer, doping the active layer with ion impurities, forming a second insulating layer on the first insulating layer to cover the first gate electrode, performing an annealing process on the active layer, forming a lower electrode of a capacitor on the second insulating layer, forming a third insulating layer on the second insulating layer to cover the lower electrode, wherein the third insulating layer has a dielectric constant that is greater than those of the first and second insulating layers, and forming an upper electrode of the capacitor on the third insulating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.