Manufacturing method of photovoltaic device and manufacturing apparatus for photovoltaic device
US9246043B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 1, 2012 |
| Grant date | Jan 26, 2016 |
| Priority date | — |
| Expiry date | Feb 1, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A manufacturing method includes a step of forming an impurity diffusion layer by diffusing an impurity element in a surface of a silicon-based substrate; and an etching step of removing the impurity diffusion layer in at least a portion of a first-surface side of the silicon-based substrate, wherein the etching step includes an etching-fluid supplying step of, on the first-surface side, supplying an etching fluid that flows to an outer edge portion of the silicon-based substrate from a supply position, and an air supplying step of, on a second-surface side, which is opposite to the first-surface side, of the silicon-based substrate, supplying air in a same direction as the etching fluid in accordance with supply of the etching fluid at the etching-fluid supplying step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.