Aluminum precursor composition
US9255324B2 · kind B2 · utility
2Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2013 |
| Grant date | Feb 9, 2016 |
| Priority date | — |
| Expiry date | May 8, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure is related to an aluminum-containing precursor composition, especially a precursor composition which is vaporized to be used for vapor phase deposition processes such as chemical vapor deposition (CVD) or atomic layer deposition (ALD).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.