Method of measuring scattering of X-rays, its applications and implementation device
US9255898B2 · kind B2 · utility
1Cited by
3References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2012 |
| Grant date | Feb 9, 2016 |
| Priority date | — |
| Expiry date | Oct 2, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/639
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a method and a device for measuring scattering of X-rays wherein the compound to be analyzed is installed in a receptacle comprising an X-ray-permeable flat bottom, wherein the X-ray diffraction analysis is undertaken by sending an X-ray stream upwards toward said X-ray-permeable bottom and by measuring the stream of scattered X-rays reflected downwards, and wherein a fluid thermostatically controlled to the same temperature as that of the compound to be analyzed in the receptacle is projected toward the X-ray permeable flat bottom, from outside the receptacle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.