Patent · US Active

Layered radiation-sensitive materials with varying sensitivity

US9256132B2 · kind B2 · utility

0Cited by
9References
20Claims
0Family size

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Key dates

Filing dateNov 4, 2014
Grant dateFeb 9, 2016
Priority date
Expiry dateNov 4, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/2022
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and applying a second radiation-sensitive material to the first radiation-sensitive material. The first radiation-sensitive material has a first sensitivity. The second radiation-sensitive material has a second sensitivity different from the first sensitivity. At least one mask is placed between at least one radiation source and the first and second radiation-sensitive materials. The mask has a plurality of substantially radiation-transparent apertures. The first and second radiation-sensitive materials are then exposed to a plurality of radiation beams through the radiation-transparent apertures in the mask to form a first construct in the first radiation-sensitive material and a second construct in the second radiation-sensitive material. The first construct and the second construct cooperate to form the radiation-cured structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.