Extended runway centerline systems and methods
US9262932B1 · kind B1 · utility
9Cited by
21References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 5, 2013 |
| Grant date | Feb 16, 2016 |
| Priority date | — |
| Expiry date | Oct 2, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG08G5/80
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Extended runway systems and methods include generating a runway centerline that extends from a start point on the runway to an endpoint located at a predefined distance from the start point. One or more distance markers are also calculated for the runway centerline. Display data is provided to an electronic display that causes the display to show the runway centerline and the one or more distance markers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.