Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation
US9263649B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 18, 2012 |
| Grant date | Feb 16, 2016 |
| Priority date | — |
| Expiry date | Dec 5, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/872
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Disclosed is a layered product for fine pattern formation and a method of manufacturing the layered product for fine pattern formation, capable of easily forming a fine pattern having a thin or no remaining film in order to form a fine pattern having a high aspect ratio on a processing object. The layered product for fine pattern formation (1) of the present invention used to form a fine pattern (220) in a processing object (200) using a first mask layer (103) includes: a mold (101) having a concavo-convex structure (101a) on a surface; and a second mask layer (102) provided on the concavo-convex structure (101a), wherein in the second mask layer (102), a distance (lcc) and a height (h) of the concavo-convex structure (101a) satisfy Formula (1) 0<lcc<1.0 h, and a distance (lcv) and the height (h) satisfy Formula (2) 0≦lcv≦0.05 h.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.