Electromagnetic waveguide and plasma source
US9265138B2 · kind B2 · utility
0Cited by
7References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2013 |
| Grant date | Feb 16, 2016 |
| Priority date | — |
| Expiry date | Apr 4, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method comprises: aligning a plasma torch within an iris cavity of an iris along a first axis between first and second iris slots having heights less than 70% of the diameter of the torch; and generating an electromagnetic field having field lines along a second axis. The field comprises a component that is substantially transverse to the first direction. An apparatus is also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.