Cleaning device resistant to liquid backsplash and cleaning system therewith
US9266151B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 1, 2013 |
| Grant date | Feb 23, 2016 |
| Priority date | — |
| Expiry date | Jul 30, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention provides a cleaning device resistant to liquid backsplash comprises an upper casing and a lower casing. The upper casing moves upward and downward relative to the lower casing. The upper casing comprises an inner wall, an outer wall, and a hollow cavity formed therebetween. The inner wall is provided with a plurality of liquid inlet apertures which are communicated with the hollow cavity. Through the liquid inlet apertures and the hollow cavity provided in the cleaning device and the cleaning system of the present invention, the chemical liquids and/or particles used are introduced into the hollow cavity via the liquid inlet apertures and discharged via the liquid discharging apertures during the high speed rotation of the wafer so as to achieve better cleaning device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.