Automated generation of mask file from three dimensional model for use in grayscale lithography
US9275173B2 · kind B2 · utility
5Cited by
2References
17Claims
0Family size
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Key dates
| Filing date | Apr 24, 2013 |
| Grant date | Mar 1, 2016 |
| Priority date | — |
| Expiry date | Apr 24, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, apparatus and program product automatically generate a grayscale lithography mask file (76) from a three dimensional (3D) model (72) of a desired topography, e.g., as generated by a three dimensional computer aided design (CAD) tool (70).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.