Patent · US Active

Automated generation of mask file from three dimensional model for use in grayscale lithography

US9275173B2 · kind B2 · utility

5Cited by
2References
17Claims
0Family size

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Key dates

Filing dateApr 24, 2013
Grant dateMar 1, 2016
Priority date
Expiry dateApr 24, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/70
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method, apparatus and program product automatically generate a grayscale lithography mask file (76) from a three dimensional (3D) model (72) of a desired topography, e.g., as generated by a three dimensional computer aided design (CAD) tool (70).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.