Method for producing hexachlorodisilane

US9278865B2 · kind B2 · utility

Assignee

• Spawnt Private S.à.r.l. · LU

Inventors

• Norbert Auner · Eutin, DE
• Christian Bauch · Muldenstein, DE
• Sven Holl · Diez, DE
• Rumen Deltschew · Leipzig, DE
• Javad Mohsseni · Bitterfeld-Wolfen, DE
• Gerd Lippold · Leipzig, DE
• Thoralf Gebel · Dresden, DE

Key dates

• Filing date: Dec 2, 2010
• Grant date: Mar 8, 2016
• Expiry date: Apr 5, 2033

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01B33/10773
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A method produces hexachlorodisilane. Hexachlorodisilane is obtained by oxidative splitting of the chlorinated polysilane of the empirical formula SiClx (x=0,2-0,8) using chlorine gas. The hexachlorodisilane is selectively obtained with a high yield.