Patent · US Active

Microstructure film

US9279906B2 · kind B2 · utility

189Cited by
2References
6Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 31, 2012
Grant dateMar 8, 2016
Priority date
Expiry dateJun 18, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24372
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The present invention is directed to a microstructure film comprising an area of microstructures and two edge areas, wherein the height of the highest part in the edge areas exceeds the height of the highest point in the microstructures, preferably by about 1 μm to about 1 mm. The application also describes how such a film may be manufactured.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.