Imprint apparatus and article manufacturing method
US9280047B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2012 |
| Grant date | Mar 8, 2016 |
| Priority date | — |
| Expiry date | Jun 14, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An imprint apparatus that molds an imprint material on a substrate using a mold, and forms a pattern on the substrate, the imprint apparatus includes a mold holding unit configured to hold the mold, which includes a surface including a pattern area, a substrate holding unit configured to hold the substrate, a first acquisition unit configured to acquire information concerning a difference in shape between the pattern area and a shot already formed on the substrate, and a control unit configured to control at least one of the mold holding unit and the substrate holding unit to adjust a spacing between the mold and the substrate, based on the information concerning the difference in shape acquired by the first acquisition unit, in a state where the pattern area and the imprint material are in contact with each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.