Patent · US Active

System, method, and apparatus for microscale plasma actuation

US9282623B2 · kind B2 · utility

6Cited by
3References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 21, 2011
Grant dateMar 8, 2016
Priority date
Expiry dateMay 9, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H1/4697
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A device is provided having a flow passage with at least one surface and at least one electrode pair positioned thereon for effecting fluid flow through the flow passage. When at least one electrode of an electrode pair of the at least one electrode pair is powered, a sheath region is generated in the flow passage, wherein the sheath region has a high electric field relative to the remainder of the flow passage. In an embodiment, one electrode of the electrode pair is separated from the other electrode of the electrode pair by a horizontal, vertical, depth, and/or total distance of about 1 microns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.