Plasma treated susceptor films
US9284108B2 · kind B2 · utility
1Cited by
52References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2013 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Feb 27, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB65D2581/3494
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of making a microwave energy interactive structure includes plasma treating the surface of a polymer film with an inert gas at a plasma treatment energy per unit surface area of the film of from about 0.005 J/cm2 to about 0.2 J/cm2 to reduce the apparent surface roughness of film the polymer film, and depositing a layer of microwave energy interactive material onto the plasma treated surface of the film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.