Processing device for producing semiconductor layers and coated substrates treated with elemental selenium and/or sulphur
US9284641B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Aug 12, 2014 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Aug 12, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/5866
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A processing device for producing semiconductor layers and coated substrates treated with elemental selenium and/or sulphur includes an evacuable processing chamber for receiving a substrate to be processed. The substrate has a metal layer and/or a layer containing metal. A heating device provides convective heating of the substrate to a predetermined temperature. A first source of elementary selenium and/or sulphur vapor is located outside the processing chamber and connected to the processing chamber via a first feed line and/or a second source of elementary selenium and/or sulphur vapor is located inside the processing chamber. The elementary selenium and/or sulphur vapor is guided past the metal layer and/or layer containing metal, chemically reacting said layer with selenium or sulphur in a targeted manner. The substrate is heated and the elementary selenium and/or sulphur vapor is mixed and guided past the substrate by forced convection of a gas conveying device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.