Process and material solution to reduce metal ion release for implantable medical device application
US9284648B2 · kind B2 · utility
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0References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 16, 2012 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Jul 1, 2033 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L2400/18
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The invention describes a method and compositions where the presence of cobalt and or nickel have been depleted from the surface layer(s) of a cobalt, chromium, nickel containing alloy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.