Patent · US Active

Plasma treatment device comprising a roller mounted rotatably in a handle housing

US9287094B2 · kind B2 · utility

11Cited by
3References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 2, 2014
Grant dateMar 15, 2016
Priority date
Expiry dateJan 2, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05H2245/40
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A plasma treatment device for treating a surface with a dielectrically impeded plasma field which is generated between an electrode (16), to which a high voltage is supplied, and the surface, wherein the electrode (16) forms, with a dielectric (17) surrounding the electrode (16), a roller (6) mounted rotatably in a grip housing (1), which roller can be rolled on the surface, has an extended treatment field and enables defined and controlled plasma treatment of the surface by virtue of the fact that the roller (6) is designed such that it can be matched flexibly to irregularities on the surface and has a rolling area with elevations (19, 19′), between which interspaces (20) forming the plasma field are located.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.