Plasma-based chemical source device and method of use thereof
US9288886B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2009 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Apr 12, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/245
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present disclosure provides for a plasma system including a plasma device coupled to a power source, an ionizable media source and a precursor source. During operation, the ionizable media source provides ionizable media and the precursor ionizable media source provides one or more chemical species, photons at specific wavelengths, as well as containing various reactive functional groups and/or components to treat the workpiece surface by working in concert for synergetic selective tissue effects. The chemical species and the ionizable gas are mixed either upstream or midstream from an ignition point of the plasma device and once mixed, are ignited therein under application of electrical energy from the power source. As a result, a plasma effluent and photon source is formed, which carries the ignited plasma feedstock and resulting mixture of reactive species to a workpiece surface to perform a predetermined reaction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.