System and method for modifying a data set of a photomask
US9292627B2 · kind B2 · utility
4Cited by
7References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2013 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Oct 28, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method for compensating infidelities of a process that transfers a pattern to a layer of an integrated circuit, by minimizing, with respect to a photomask pattern, a cost function that quantifies the deviation between designed and simulated values of circuit parameters of the pattern formed on a semiconductor wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.